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Reliable Supplier Ti Pieces - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Dedicated to strict top quality command and considerate purchaser support, our experienced staff customers are always available to discuss your necessities and be certain full client gratification for Iron Cobalt Sputtering Target , Iron Silicon Fesi Sputtering Target , Boron B Sputtering Target , Never-ending improvement and striving for 0% deficiency are our two main quality policies. Should you need anything, don't hesitate to contact us.
Reliable Supplier Ti Pieces - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Copper Manganese alloy sputtering target is fabricated by means of vacuum melting. It has homogenous microstructure, high hardness and anti-deformation properties, and long service life. So it could help to reduce manufacturing costs because it is unnecessary to replace the sputter targets at frequent intervals.

Copper Manganese alloy could also be used to produce Manganese brass and Cu-Ni-Mn Alloys. Manganese shows substantial solid solubility in copper and is an effective solid solution strengthening agent. It could noticeably improve the hardness and strength, and corrosion resistance behavior in marine, chloride medium and vapor pressure.

Copper is a chemical element originated from the Old English name coper, which in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Manganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

A wide range of special materials specialising in the manufacture of sputtering targets, we can produce copper and manganese sputtering materials to customer specifications. For more information, please contact us.


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We aim to find out quality disfigurement from the production and supply the best service to domestic and overseas customers wholeheartedly for Reliable Supplier Ti Pieces - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Barbados, Iran, Sierra Leone, our qualify products have good reputation from the world as its most competive price and our most advantage of after-sale service to the clients.we hope we can provide a safe, environmental products and super service to our clients from all of the world and establish strategic partnership with them by our professional standards and unremitting efforts.
  • The customer service staff's attitude is very sincere and the reply is timely and very detailed, this is very helpful for our deal,thank you.
    5 Stars By Penelope from Saudi Arabia - 2017.09.16 13:44
    Goods just received, we are very satisfied, a very good supplier, hope to make persistent efforts to do better.
    5 Stars By Laurel from El Salvador - 2018.10.31 10:02