Wholesale Reasonable price Aluminum-Copper Sputtering Target - V Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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Our enterprise since its inception, constantly regards product good quality as organization life, constantly improve production technology, strengthen merchandise high quality and continuously strengthen enterprise total good quality administration, in strict accordance with all the national standard ISO 9001:2000 for Titanium Aluminum Sputtering Target , Arc Ion Plating , Ruthenium Ru Sputtering Target , Welcome all nice buyers communicate details of products and ideas with us!!

Reasonable price Aluminum-Copper Sputtering Target - V Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Vanadium Sputtering Target Description

Vanadium is a hard, ductile metal with a silvery-gray appearance. It is harder than most metals and exhibits good corrosion resistance against alkalis and acids. Its melting point is 1890℃, and boiling point is 3380℃. Its atomic number is 23, and atomic weight is 50.9414. It has a face-centered cubic structure and oxidation states in its compounds of +5, +4, +3 and +2. It has high melting point, ductility, hardness, and corrosion resistance.

Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.

High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.

Chemical Analysis

Purity	99.7	99.9	99.95	99.99
Fe	≤0.1	≤0.05	≤0.02	≤0.01
Al	≤0.2	≤0.05	≤0.03	≤0.01
Si	≤0.15	≤0.1	≤0.05	≤0.01
C	≤0.03	≤0.02	≤0.01	≤0.01
N	≤0.01	≤0.01	≤0.01	≤0.01
O	≤0.05	≤0.05	≤0.05	≤0.03
Impurity in total	≤0.3	≤0.1	≤0.05	≤0.01

Vanadium Sputtering Target Packaging

Our Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s vanadium sputtering targets offer superb purity and consistency. They are available in a variety of forms, purity, sizes and prices. We specialise in high purity thin film coating materials with excellent properties, as well as the highest possible density and smallest possible average grain size, for die coating, decoration, automotive parts, low E glass, semiconductor integrated circuits, thin film resistors, graphic displays, aerospace, magnetic recording, touch screens, thin film solar cells and other physical vapour deposition (PVD) applications. Please send us an enquiry for current pricing on sputtering targets and other deposition materials not listed.

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As a way to present you with ease and enlarge our enterprise, we also have inspectors in QC Workforce and assure you our greatest support and solution for Reasonable price Aluminum-Copper Sputtering Target - V Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Australia, California, Cyprus, Most problems between suppliers and clients are due to poor communication. Culturally, suppliers can be reluctant to question items they do not understand. We break down people barriers to ensure you get what you want to the level you expect, when you want it. Faster delivery time and the product you want is our Criterion .

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The company can think what our think, the urgency of urgency to act in the interests of our position, can be said this is a responsible company, we had a happy cooperation!

By Ingrid from Namibia - 2018.06.09 12:42

This manufacturers not only respected our choice and requirements, but also gave us a lot of good suggestions, ultimately， we successfully completed the procurement tasks.

By Arlene from Saudi Arabia - 2017.03.07 13:42