Quality Inspection for Tantalum Sputtering Target - Wni Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Tungsten Molybdenum alloy sputtering target is fabricated by means of vacuum melting of powder metallurgy. The content of Tungsten ranges mostly between 30% and 50%. Tungsten Molybdenum targets are available in different geometric forms: rod, plate, wire or other customized forms according to design paper.

Tungsten Molybdenum alloy is a critical material used in electronics, aerospace, weapons, and other fields. Tungsten Molybdenum alloy with 30% content of Tungsten has excellent corrosion resistance against liquid Zinc and are used in the manufacture of agitators, piping and container linings and other components of the zinc smelting industry. Tungsten Molybdenum has high-temperature suitability and light weight, so any applications or industries that operate equipment under high temperatures can benefit from using W-Mo alloys, such as rocket and missile components, filament circuit and other high temperature materials.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Tungsten Molybdenum Sputtering Materials according to Customers’ specifications. For more information, please contact us.