Professional Design Fecr Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
Professional Design Fecr Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Silicon Sputtering Target Description
The targets are prepared by blending Aluminum and Silicon powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape. Our Aluminum Silicon sputtering targets are available in rectangular, circular or custom-made geometric forms, Aluminum content from 10-90% atomic, and feature high purity, homogeneous microstructure, high density and long working life.
Aluminum Silicon is extensively used in automotive, aircraft and construction industries for its unique combination of desirable characteristics, including light weight , good thermal conductivity and mechanical properties. The density of this material is 2.6~2.7g/cm3, thermal conductivity coefficient 101~126W/(m·℃), tensile modulus 71.0GPa, fatigue limit ±45MPa. Aluminum-silicon alloys also possess excellent corrosion resistance, machinability, and weldability. Aluminum-silicon alloys are used in a variety of automotive, aerospace, and consumer product applications, like engine blocks and cylinder liners, pistons, bearing alloy materials, and consumer electronics components.+2. It has high melting point, ductility, hardness, and corrosion resistance.
Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.
High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.
Aluminum Silicon Sputtering Target Packaging
Our Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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"Sincerity, Innovation, Rigorousness, and Efficiency" is definitely the persistent conception of our corporation to the long-term to establish alongside one another with customers for mutual reciprocity and mutual profit for Professional Design Fecr Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Venezuela, Greenland, Malaysia, Honest to every customers are our requested! First-class serve, best quality, best price and fastest delivery date is our advantage! Give every customers good serve is our tenet! This makes our company get the favour of customers and support! Welcome all over the world customers send us enquiry and looking forward your good co-operation !Make sure you your inquiry for more details or request for dealership in selected regions.
Factory equipment is advanced in the industry and the product is fine workmanship, moreover the price is very cheap, value for money!










