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Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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Our personnel are generally in the spirit of "continuous improvement and excellence", and together with the outstanding top quality merchandise, favorable price tag and fantastic after-sales solutions, we try to gain every single customer's rely on for Glass Sealing Alloy , Pieces , Y Sputtering Target , Welcomes all abroad close friends and retailers to ascertain collaboration with us. We are going to give you with genuine, high-quality and successful company to satisfy your requirements.
Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Professional China  Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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We stay with our company spirit of "Quality, Performance, Innovation and Integrity". We goal to create more value for our clients with our abundant resources, advanced machinery, experienced workers and superb solutions for Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Pakistan, venezuela, New Zealand, We are confident that we are able to provide you with opportunities and will be a valuable business partner of you. We look forward to working with you soon. Learn more about the types of products that we work with or contact us now directly with your inquiries. You are welcome to contact us anytime!
  • Timely delivery, strict implementation of the contract provisions of the goods, encountered special circumstances, but also actively cooperate, a trustworthy company!
    5 Stars By Cheryl from India - 2018.06.28 19:27
    Reasonable price, good attitude of consultation, finally we achieve a win-win situation,a happy cooperation!
    5 Stars By Leona from Myanmar - 2017.03.07 13:42