Wholesale Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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We follow our enterprise spirit of "Quality, Efficiency, Innovation and Integrity". We aim to create much more worth for our buyers with our abundant resources, highly developed machinery, experienced workers and great providers for Mn Sputtering Target , Thermal Barrier Coating , Iron Manganese Femn Sputtering Target , Leading the trend of this field is our persistent objective. Supplying first class solutions is our intention. To create a beautiful upcoming, we wish to cooperate with all close friends in the home and overseas. Should you have got any interest in our products and solutions, remember to never wait to call us.

Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Bear "Customer first, Excellent first" in mind, we operate closely with our customers and supply them with efficient and expert services for Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Haiti, Istanbul, Madagascar, Our company insists on the purpose of "takes service priority for standard, quality guarantee for the brand, do business in good faith, to provide professional, rapid, accurate and timely service for you". We welcome old and new customers to negotiate with us. We will serve you with all sincerity!

Cobalt Chromium Sputtering Target