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Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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We know that we only thrive if we can guarantee our combined price competiveness and quality advantageous at the same time for Magnesium Sputtering Target , Nickel Chromium Pieces , Nickel Iron Ni/Fe Sputtering Target , Adhering to the business philosophy of 'customer first, forge ahead', we sincerely welcome clients from at home and abroad to cooperate with us give you best service!
Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Professional China  Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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The client satisfaction is our primary concentrate on. We uphold a consistent level of professionalism, top quality, credibility and service for Professional China Metal Material - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Accra, Malta, Bangladesh, We have a strict and complete quality control system, which ensures that each product can meet quality requirements of customers. Besides, all of our products have been strictly inspected before shipment.
  • Adhering to the business principle of mutual benefits, we have a happy and successful transaction, we think we will be the best business partner.
    5 Stars By Megan from Detroit - 2018.06.12 16:22
    We have been engaged in this industry for many years, we appreciate the work attitude and production capacity of the company, this is a reputable and professional manufacturer.
    5 Stars By Evelyn from Birmingham - 2017.08.21 14:13