PriceList for Magnesium Fluoride Mgf2 Sputtering Target - Aluminum – Rich
PriceList for Magnesium Fluoride Mgf2 Sputtering Target - Aluminum – Rich Detail:
Aluminum a lightweight silvery white metal with symbol Al and atomic number 13. It is soft, ductile, corrosion resistant and has a high electrical conductivity.
When the surface of aluminum is exposed to air, a protective oxide coating would form almost instantaneously. This oxide layer is corrosion resistant and can be further enhanced with surface treatments such as anodizing. Aluminum is an excellent thermal and electric conductor. Aluminum is one of the lightest engineering, the conductivity of aluminum is around twice that of copper by weight, which is the first consideration in its use as large power transmission lines, electrical conduction applications including domestic wiring, overhead and high voltage power lines.
Aluminum sputtering target is widely used in the formation of thin films for semiconductors, capacitors, decorations, integrated circuit, and flat panel display. Aluminum targets would be the first candidates if the demand could be satisfied for its cost-saving advantage.
| Symbol | Al | ||
| Relative Molecular Mass | 26.98 | Latent Heat of Vaporization | 11.4J |
| Atomic Volume | 9.996*10-6 | Vapor Tension | 660/10-8-10-9 |
| Crystalline | FCC | Conductivity | 37.67S/m |
| Bulk Density | 74% | Resistance Coefficient | +0.115 |
| Coordination Number | 12 | Absorption Spectrum | 0.20*10-24 |
| Lattice Energy | 200*10-7 | Poisson’s Ratio | 0.35 |
| Density | 2.7g/cm3 | Compressibility | 13.3mm2/MN |
| Elastic Modulus | 66.6Gpa | Melting Point | 660.2 |
| Shear Modulus | 25.5Gpa | Boiling Point | 2500 |
Rich Special Materials is a Manufacturer of Sputtering Target and could produce high purity Aluminum Sputtering Materials with purity up to 6N according to Customers’ specifications. For more information, please contact us.
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