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One of Hottest for Physical Vapor Deposition - Cucr Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Assume full obligation to meet all demands of our customers; accomplish ongoing advancements by promoting the advancement of our customers; become the final permanent cooperative partner of clientele and maximize the interests of shoppers for Anticorrosion Alloy , Tio2 Sputtering Target , Physical Vapor Deposition , We are always looking forward to forming successful business relationships with new clients around the world.
One of Hottest for Physical Vapor Deposition - Cucr Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Copper Chromium alloy sputtering target is a Cu-based material with Chromium element added into it. It has high mechanical strength and hardness, excellent electric and heat conductivity. Cu-Cr alloy has gained a variety of applications that operate equipment under high temperatures because of its specific characteristics: high-temperature suitability, oxidation resistance, corrosion resistance and machinability.

Copper Chromium material has high hardness, wear resistance, bend resistance, crack resistance and high transition temperature. is a kind of renewable energy. The trivalent chromium present does not pose hazard to human health. It is also a common conducting material. Copper Chromium has been extensively used in Optoelectronic Technology products, like touch panel, LCD and solar cells.

Rich Special Materials is a Manufacturer of Sputtering Target could produce Copper Chromium Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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