Wholesale OEM Customized Cu Sputtering Target - Feal Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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We often persist with the theory "Quality To start with, Prestige Supreme". We are fully committed to delivering our clientele with competitively priced good quality items, prompt delivery and experienced support for Ag Granules , Cobalt Nickel Chromium Molybdenum Sputtering Target , Vacuum Engineering , We warmly welcome all standpoint inquiries from home and abroad to cooperate with us, and anticipate your correspondence.

OEM Customized Cu Sputtering Target - Feal Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Usually, Iron Aluminum alloy sputtering target has 6%-16% content of Aluminum. It shows excellent magnetic properties and is often used in the film deposition of micromotors.
Iron Aluminum alloys are conventionally available in strips with thickness of 0.1-0.5mm. They feature high resistivity, hardness, vibration and impact resistance, combined with low density（6.5~7.2g/m3）. Iron cores made from Iron Aluminum sheets has low eddy current loss and light weight.

Iron Aluminum Alloys are segmented into: 1J6. 1J12. 1J16, the number behind J is the content of Aluminum. With the increase of Aluminum content, the magnetic conductivity and resistivity of the materials would be improved, while the saturation magnetic induction – decreased.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Aluminum Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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