OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.
Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.
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With advanced technologies and facilities, strict high-quality handle, reasonable rate, superior services and close co-operation with prospects, we are devoted to furnishing the best price for our customers for OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Montreal, Mali, Comoros, We integrate all our advantages to continuously innovate, improve and optimize our industrial structure and product performance. We will always believe in and work on it. Welcome to join us to promote green light, together we will make a better Future!
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