New Delivery for Tantalum Ta Sputtering Target - Raw Material High Purity 99.9999% Titanium alloy additive Ti Si particles Titanium Silicon granule – Rich
New Delivery for Tantalum Ta Sputtering Target - Raw Material High Purity 99.9999% Titanium alloy additive Ti Si particles Titanium Silicon granule – Rich Detail:
Raw Material High Purity 99.9999% Titanium alloy additive Ti Si particles Titanium Silicon granule,
Ti Si particles Titanium Silicon granule High Purity 99.9999%,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.
Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.
Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.
Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Titanium Silicon alloy sputtering target is produced by means of vacuum hot pressing method.
Our Titanium Silicon sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium Silicon nitride (TiSiN). TiSiN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.
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By Modesty from Auckland - 2018.12.14 15:26
The customer service staff is very patient and has a positive and progressive attitude to our interest, so that we can have a comprehensive understanding of the product and finally we reached an agreement, thanks!
By Erin from South Korea - 2018.11.04 10:32
