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Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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Our advancement depends on the superior gear ,superb talents and consistently strengthened technology forces for Mn Pieces , Tablets , Coating , With the development of society and economy, our company will keep a tenet of "Focus on trust, quality the first", moreover, we expect to create a glorious future with every customer.
Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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Our enterprise since its inception, often regards solution excellent as enterprise life, continually strengthen output technology, enhance product high quality and continually strengthen organization total high-quality administration, in strict accordance using the national standard ISO 9001:2000 for Massive Selection for V Ingot - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Czech, Leicester, Hongkong, Over the years, with high-quality solutions, first- class service, ultra-low prices we win thee trust and favor of customers. Nowadays our products sell all over the domestic and abroad. Thanks for the regular and new customers support. We offer high quality product and competitive price, welcome the regular and new customers cooperate with us!
  • Problems can be quickly and effectively resolved, it is worth to be trust and working together.
    5 Stars By John from Grenada - 2018.06.09 12:42
    In our cooperated wholesalers, this company has the best quality and reasonable price, they are our first choice.
    5 Stars By Letitia from Kazakhstan - 2018.07.27 12:26