Manufacturing Companies for High-Entropy Alloy - WNiFe Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Tungsten Nickel Iron alloy sputtering target is fabricated by means of powder metallurgy. It has a lot of distinct properties, such as high density, ductility, and strength that are relatively unmatched by virtually any other metal alloy. Conventionally the Nickel Iron ratio would be 7:3 or 1:1.

Tungsten Nickel Iron alloy features high density, strength, plasticity, machinability, excellent thermal and electric conductivity, and capacity to absorb x-ray and γ rays. Tungsten Nickel Iron alloy is extensively used in shielding, counterweight, balancing, vibration dampening, temperature tooling applications.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Tungsten Nickel Iron Sputtering Materials according to Customers’ specifications. For more information, please contact us.