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Manufactur standard Nipt Sputtering Target - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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"Sincerity, Innovation, Rigorousness, and Efficiency" is the persistent conception of our firm to the long-term to develop together with consumers for mutual reciprocity and mutual advantage for Mn Sputtering Target , Deposition Materials , Terbium Tb Sputtering Target , Being a young growing company, we might not the best, but we are trying our best to be your good partner.
Manufactur standard Nipt Sputtering Target - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Copper Manganese alloy sputtering target is fabricated by means of vacuum melting. It has homogenous microstructure, high hardness and anti-deformation properties, and long service life. So it could help to reduce manufacturing costs because it is unnecessary to replace the sputter targets at frequent intervals.

Copper Manganese alloy could also be used to produce Manganese brass and Cu-Ni-Mn Alloys. Manganese shows substantial solid solubility in copper and is an effective solid solution strengthening agent. It could noticeably improve the hardness and strength, and corrosion resistance behavior in marine, chloride medium and vapor pressure.

Copper is a chemical element originated from the Old English name coper, which in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Manganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

A wide range of special materials specialising in the manufacture of sputtering targets, we can produce copper and manganese sputtering materials to customer specifications. For more information, please contact us.


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Innovation, quality and reliability are the core values of our company. These principles today more than ever form the basis of our success as an internationally active mid-size company for Manufactur standard Nipt Sputtering Target - Cumn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Austria, Grenada, Nairobi, After years of development, we have formed strong ability in new product development and strict quality control system to ensure excellent quality and service. With the support of many long term cooperated customers, our products are welcomed all over the world.
  • The company can think what our think, the urgency of urgency to act in the interests of our position, can be said this is a responsible company, we had a happy cooperation!
    5 Stars By lucia from Jeddah - 2018.02.08 16:45
    The factory has advanced equipment, experienced staffs and good management level, so product quality had assurance, this cooperation is very relaxed and happy!
    5 Stars By ron gravatt from San Francisco - 2018.08.12 12:27