Wholesale Low MOQ for Silicon Si Sputtering Target - Cual Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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That has a sound small business credit, great after-sales service and modern production facilities, we've earned an outstanding standing amid our buyers across the earth for Compound Ceramic Sputtering Target , Iron Manganese Femn Sputtering Target , Boron B Sputtering Target , With the eternal goal of "continuous quality improvement, customer satisfaction", we are sure that our product quality is stable and reliable and our products are best-selling at home and abroad.

Low MOQ for Silicon Si Sputtering Target - Cual Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Copper Aluminum sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has the similar chemical properties with Aluminum. CuAl has high mechanical properties, excellent machinability, and high-temperature suitability, so it could be the suitable material for high performance Aluminum alloy. High purity CuAl alloy sputtering target could be used in a broad range of industrial fields from semiconductor and electronic functional components.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Copper Aluminum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Copper Cu Sputtering Target