Leading Manufacturer for Ta Sputtering Target - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Leading Manufacturer for Ta Sputtering Target - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Vanadium sputtering target has 52% content of Cobalt, 9%-23% content of Vanadium and the rest – ductile permanent-magnetic material. It exhibits excellent plastic deformation capacity and could be fabricated into components with complicated forms.
Cobalt Iron Vanadium alloy sputtering target has extremely high saturation flux density Bs(2.4T) and Curie temperature(980~1100℃). It can help with weight reduction and can improve stability at elevated temperatures. It is a suitable material for aviation electric appliances(small special electrical machines, electromagnet and electric relay). It also has high saturation magnetostriction coefficient, and could produce magnetostrictive transducer.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Vanadium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Our products are widely recognized and trusted by users and can meet continuously changing economic and social needs for Leading Manufacturer for Ta Sputtering Target - Cofev Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Gabon, Salt Lake City, Liberia, Profession, Devoting are always fundamental to our mission. We've got always been in line with serving customers, creating value management objectives and adhering to the sincerity, dedication, persistent management idea.
By Alex from Kuwait - 2018.02.21 12:14
Goods just received, we are very satisfied, a very good supplier, hope to make persistent efforts to do better.
By Christopher Mabey from Italy - 2018.09.21 11:01
