Leading Manufacturer for Copper Nickel Titanium Alloy Sputtering Target - Feta Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Iron Tantalum Sputtering Target Description

Iron Tantalum alloy is a suitable material for evaporation sources, electron tubes, prosthetic devices, and rectifiers. We employ advanced technique of casting and rapid solidification to obtain Fe-Ta alloy with high purity and homogenous structure. The target we produce has excellent mechanical properties and could produce refined surface layers.

Iron Tantalum Sputtering Target Packaging

Our Iron Tantalum sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Iron Tantalum sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices.

We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores, or cracks.

We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD)  applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.