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Hot New Products Coating Material - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Our business has been focusing on brand strategy. Customers' pleasure is our best advertising. We also offer OEM company for Mg Sputtering Target , Mg Ingot , Ti/Si Sputtering Target , We welcome new and aged buyers from all walks of daily life to get hold of us for upcoming business enterprise interactions and acquiring mutual good results!
Hot New Products Coating Material - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Nickel Vanadium Sputtering Target Description

Gold is often applicated in the deposition of integrated circuit layer, but AuSi low-melting compound is often formed if Gold is combined with Silicon, which would cause the looseness between different layers. Pure Nickel is a good choice for Adhesive layer, while a Barrier layer is also required between the Nickel and Gold layer to prevent proliferation. Vanadium could perfectly satisfy this requirement with high melting point and capacity of standing high ampere density. Therefore Nickel, Vanadium and Gold are three materials usually applicated in integrated circuit industry. Nickel Vanadium Sputtering Target is manufactured by adding Vanadium into molten Nickel. With low ferromagnetism, it is a good choice for the magnetron sputtering of electronic products, which could produce Nickel layer and Vanadium layer in one time.

Ni-7V wt% Impurity Content

Purity

Main Component(wt%)

Impurity Chemicals(≤ppm)

Impurity In total(≤ppm)

V

Fe

Al

Si

C

N

O

S

99.99

7±0.5

20

30

20

100

30

100

20

100

99.95

7±0.5

200

200

200

100

100

200

50

500

99.9

7±0.5

300

300

300

100

100

200

50

500

Nickel Vanadium Sputtering Target Packaging

Our Nickel Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Nickel Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.


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We have our own sales team, design team, technical team, QC team and package team. We have strict quality control procedures for each process. Also, all of our workers are experienced in printing field for Hot New Products Coating Material - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Russia, Orlando, Australia, We take measure at any expense to achieve essentially the most up-to-date equipment and approaches. The packing of nominated brand is our a further distinguishing feature. The items to assure years of trouble-free service has attracted a great deal customers. The solutions are obtainable in improved designs and richer assortment, they're created scientifically of purely raw supplies. It readily available in a variety of designs and specifications for your selection. The most recent kinds are a great deal better than the preceding one particular and they are quite popular with lots of prospects.
  • Speaking of this cooperation with the Chinese manufacturer, I just want to say"well dodne", we are very satisfied.
    5 Stars By Anne from Japan - 2018.12.25 12:43
    The company can keep up with the changes in this industry market, product updates fast and the price is cheap, this is our second cooperation, it's good.
    5 Stars By Georgia from Seychelles - 2018.03.03 13:09