Good Quality Sputtering Thin Film Target Materials - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
Good Quality Sputtering Thin Film Target Materials - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:
1. Powder grinding and mixing.
2. Hot isostatic pressing treatment to get semi-finished products.
3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.
During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.
Our typical AlCr targets and their properties
|
Cr-70Al at% |
Cr-60Al at% |
Cr-50Al at% |
|
|
Purity (%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
|
Density（g/cm3） |
3.7 |
4.35 |
4.55 |
|
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
|
Process |
HIP |
HIP |
HIP |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
Our typical AlCr targets and their properties
|
Cr-70Al at% |
Cr-60Al at% |
Cr-50Al at% |
|
|
Purity (%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
|
Density（g/cm3） |
3.7 |
4.35 |
4.55 |
|
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
|
Process |
HIP |
HIP |
HIP |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
Product detail pictures:
Related Product Guide:
With our leading technology as well as our spirit of innovation,mutual cooperation, benefits and development, we will build a prosperous future together with your esteemed company for Good Quality Sputtering Thin Film Target Materials - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Johannesburg, Ghana, Atlanta, Our factory covers an area of 12,000 square meters, and has a staff of 200 people, among which there are 5 technical executives. We are specialized in producing.We have rich experience in export. Welcome to contact us and your enquiry will be replied as soon as possible.
By Elva from United States - 2018.03.03 13:09
The factory has advanced equipment, experienced staffs and good management level, so product quality had assurance, this cooperation is very relaxed and happy!
By Betty from Dubai - 2017.06.29 18:55
