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Vanadium Sputtering Target Description

Vanadium is a hard, ductile metal with a silvery-gray appearance. It is harder than most metals and exhibits good corrosion resistance against alkalis and acids. Its melting point is 1890℃, and boiling point is 3380℃. Its atomic number is 23, and atomic weight is 50.9414. It has a face-centered cubic structure and oxidation states in its compounds of +5, +4, +3 and +2. It has high melting point, ductility, hardness, and corrosion resistance.

Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.

High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.

Chemical Analysis

Purity	99.7	99.9	99.95	99.99
Fe	≤0.1	≤0.05	≤0.02	≤0.01
Al	≤0.2	≤0.05	≤0.03	≤0.01
Si	≤0.15	≤0.1	≤0.05	≤0.01
C	≤0.03	≤0.02	≤0.01	≤0.01
N	≤0.01	≤0.01	≤0.01	≤0.01
O	≤0.05	≤0.05	≤0.05	≤0.03
Impurity in total	≤0.3	≤0.1	≤0.05	≤0.01

Vanadium Sputtering Target Packaging

Our Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s vanadium sputtering targets offer superb purity and consistency. They are available in a variety of forms, purity, sizes and prices. We specialise in high purity thin film coating materials with excellent properties, as well as the highest possible density and smallest possible average grain size, for die coating, decoration, automotive parts, low E glass, semiconductor integrated circuits, thin film resistors, graphic displays, aerospace, magnetic recording, touch screens, thin film solar cells and other physical vapour deposition (PVD) applications. Please send us an enquiry for current pricing on sputtering targets and other deposition materials not listed.

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