Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Nickel Aluminum alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide NiAl casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the NiAl coating has good performance under 700℃. Now the NiAl sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Nickel Aluminum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Our pursuit and company goal is to "Always satisfy our customer requirements". We continue to develop and design superior quality products for both our old and new customers and achieve a win-win prospect for our clients as well as us for Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Paraguay, Gabon, Florence, Our company has already have pass the ISO standard and we are fully respect our customer 's patents and copyrights. If the customer provides their own designs, We will guarantee that they will be the only one can have that products. We hoping that with our good products can bring our customers a great fortune.
Speaking of this cooperation with the Chinese manufacturer, I just want to say"well dodne", we are very satisfied.









