Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Nickel Aluminum alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide NiAl casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the NiAl coating has good performance under 700℃. Now the NiAl sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Nickel Aluminum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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The corporation keeps to the operation concept "scientific management, superior quality and performance primacy, consumer supreme for Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Juventus, Botswana, Sri Lanka, By adhering to the principle of "human oriented, winning by quality", our company sincerely welcomes merchants from at home and abroad to visit us, talk business with us and jointly create a brilliant future.
The supplier cooperation attitude is very good, encountered various problems, always willing to cooperate with us, to us as the real God.










