Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Nickel Aluminum alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide NiAl casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the NiAl coating has good performance under 700℃. Now the NiAl sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Nickel Aluminum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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"Based on domestic market and expand overseas business" is our development strategy for Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Nial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Mauritius, Russia, Mombasa, We have more than 10 years exported experience and our products have expored more than 30 countries around the word . We always hold the service tenet Client first,Quality first in our mind,and are strict with product quality. Welcome your visiting!
This company has the idea of "better quality, lower processing costs, prices are more reasonable", so they have competitive product quality and price, that's the main reason we chose to cooperate.










