Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Alcu Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Alcu Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Copper sputtering target is perfect for a number of industries and applications, due to its high hardness, tensile strength and light weight. It has usually 1-3% copper content and has the similar chemical properties with Aluminum. AlCu has high mechanical properties, excellent machinability, and high-temperature suitability, so it could be the suitable material for high performance Aluminum alloy. High purity AlCu alloy sputtering target could be used in a broad range of industrial fields from semiconductor and electronic functional components.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores, or cracks. For more information, please contact us.
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Our well-equipped facilities and excellent quality control throughout all stages of production enables us to guarantee total customer satisfaction for Factory supplied Tungsten Silicide Wsi2 Sputtering Target - Alcu Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Mauritius, Malaysia, Swansea, we have all day online sales to make sure the pre-sale and after-sale service in time. With all these supports, we can serve every customer with quality product and timely shipping with highly responsibility. Being a young growing company, we might not the best, but we are trying our best to be your good partner.
The enterprise has a strong capital and competitive power, product is sufficient, reliable, so we have no worries on cooperating with them.










