Wholesale Factory source Cr Sputtering Target - Conbzr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

Factory source Cr Sputtering Target - Conbzr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Featured Image

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We have now a hugely efficient team to deal with inquiries from buyers. Our goal is "100% client gratification by our solution high-quality, rate & our team service" and take pleasure in a great popularity among clients. With several factories, we will provide a wide assortment of Ni/Fe Sputtering Target , Non-Ferrous Metal , Yttrium Sputtering Target , We are devoted to provide professional purification technology and solutions for you!

Factory source Cr Sputtering Target - Conbzr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Sputter targets made of ferromagnetic materials are critical to thin film deposition in industries such as data storage and VLSI (very large-scale integration)/semiconductors. Cobalt Niobium Zirconium is fabricated by melting the alloys in a vacuum environment and subsequent casting to form the desired target shape. CoNbZr alloy sputtering target is often used as deposition source for ferromagnetic layer in the production of magnetic storage media and transitional layer in battery fabrication.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Niobium Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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Cobalt Tantalum Zirconium Sputtering Target