Factory source Cr Sputtering Target - Conbzr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Sputter targets made of ferromagnetic materials are critical to thin film deposition in industries such as data storage and VLSI (very large-scale integration)/semiconductors. Cobalt Niobium Zirconium is fabricated by melting the alloys in a vacuum environment and subsequent casting to form the desired target shape. CoNbZr alloy sputtering target is often used as deposition source for ferromagnetic layer in the production of magnetic storage media and transitional layer in battery fabrication.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Niobium Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.