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Factory Price 99.95% Pure Chromium Sputtering Target for PVD Coating

Titanium

Short Description:

Category

Metal Sputtering Target

Chemical Formula

Ti

Composition

Titanium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Dedicated to strict excellent control and considerate shopper company, our experienced staff members associates are often available to discuss your demands and make certain full buyer pleasure for Factory Price 99.95% Pure Chromium Sputtering Target for PVD Coating, Special emphasis around the packaging of merchandise to avoid any damage during transportation,Detailed interest into the useful feedback and strategies of our esteemed shoppers.
Dedicated to strict excellent control and considerate shopper company, our experienced staff members associates are often available to discuss your demands and make certain full buyer pleasure for China Chromium Supplier and Chromium Manufacturer, Our company sticks to the principle of “high quality, reasonable price and timely delivery”. We sincerely hope to establish good cooperative relationships with our new and old business partners from all parts of the world. We hope to work with you and serve you with our excellent goods and services. Welcome to join us!

Titanium Sputtering Target Description

Titanium is a chemical element with the symbol Ti and atomic number 22. It is a lustrous transition metal with a silver color. Its melting point is (1660±10)℃, boiling point is 3287℃. It has light weight, high hardness, corrosion resistance to all types of chlorine chemicals.

Titanium resists corrosion by seawater, and it can dissolve in both acidic and in alkaline media.

Titanium alloy is extensively used in aerospace, chemical engineering, petroleum, medicine, construction, and other fields for its outstanding properties, like low density, thermal conductivity and excellent corrosion resistance, weldability and biocompatibility.

Titanium could absorb hydrogen, CH4 and Co2 gases, and it is widely used in high vacuum and ultra-high vacuum systems. Titanium sputtering target could be used for the fabrication of LSI, VLSI and ULSI circuit network, or barrier metal materials.

Titanium Sputtering Target Packaging

Our Titanium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Titanium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.Dedicated to strict excellent control and considerate shopper company, our experienced staff members associates are often available to discuss your demands and make certain full buyer pleasure for Factory Price 99.95% Pure Chromium Sputtering Target for PVD Coating, Special emphasis around the packaging of merchandise to avoid any damage during transportation,Detailed interest into the useful feedback and strategies of our esteemed shoppers.
Factory Price China Chromium Supplier and Chromium Manufacturer, Our company sticks to the principle of “high quality, reasonable price and timely delivery”. We sincerely hope to establish good cooperative relationships with our new and old business partners from all parts of the world. We hope to work with you and serve you with our excellent goods and services. Welcome to join us!


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