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factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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We can easily usually fulfill our respected customers with our very good top quality, very good price tag and excellent support due to we have been more expert and much more hard-working and do it in cost-effective way for Ni/Fe Sputtering Target , Wsi2 Sputtering Target , Hastelloy , We warmly welcome mates from all walks of life to hunt mutual cooperation and develop a more good and splendid tomorrow.
factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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To become the stage of realizing dreams of our employees! To build a happier, much more united and far more professional team! To reach a mutual profit of our clients, suppliers, the society and ourselves for factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Thailand, luzern, Sierra Leone, We look forward to hearing from you, whether you are a returning customer or a new one. We hope you will find what you are looking for here, if not, please contact us immediately. We pride ourselves on top notch customer service and response. Thank you for your business and support!
  • A good manufacturers, we have cooperated twice, good quality and good service attitude.
    5 Stars By Michelle from Roman - 2017.08.15 12:36
    The supplier cooperation attitude is very good, encountered various problems, always willing to cooperate with us, to us as the real God.
    5 Stars By Iris from Lithuania - 2017.04.28 15:45