Welcome to our websites!

factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Short Description:


Product Detail

Product Tags

Related Video

Feedback (2)

We aim to find out high quality disfigurement in the generation and provide the most effective services to domestic and abroad clients wholeheartedly for Sputtering Target Plate , Indium Bonding , Ti/Al Sputtering Target , Our goal is to create Win-win situation with our customers. We believe we will be your best choice. "Reputation First, Customers Foremost. "Waiting for your inquiry.
factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


Product detail pictures:

factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


Related Product Guide:

Innovation, excellent and reliability are the core values of our company. These principles today much more than ever form the basis of our success as an internationally active mid-size business for factory Outlets for Cobalt Chromium Tungsten Sputtering Target - AlCr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Portugal, kazakhstan, Germany, We have our own registered brand and our company is developing rapidly owing to high quality products, competitive price and excellent service. We sincerely hope to establish business relations with more friends from home and abroad in the near future. We look forward to your correspondence.
  • The supplier abide the theory of "quality the basic, trust the first and management the advanced" so that they can ensure a reliable product quality and stable customers.
    5 Stars By Anna from Buenos Aires - 2018.06.05 13:10
    The company's products can meet our diverse needs, and the price is cheap, the most important is that the quality is also very nice.
    5 Stars By Julia from Bangladesh - 2017.10.27 12:12