Factory making Yttrium Y Sputtering Target - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory making Yttrium Y Sputtering Target - Fecota Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Iron Cobalt Tantalum targets are usually available in circular shape and critical thin film materials of vertical magnetic recording media. The considerable amount of Tantalum present in the alloy would result in segregation and present undissolved particles. We employ unique production method which could ensure the homogeneity of the microstructure and improve the mechanical properties of the materials.
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Product name |
FeCoTa |
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Fe/wt% |
Balance |
Balance |
Balance |
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|
Co/wt% |
21.6±0.5 |
21.9±0.5 |
20.2±0.5 |
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|
Ta/wt% |
41.1±0.8 |
39.4±0.8 |
44.3±0.8 |
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Metal impurity content(ppm) |
Ni |
≤100 |
≤100 |
≤100 |
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Al |
≤300 |
≤300 |
≤300 |
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|
Si |
≤200 |
≤200 |
≤200 |
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|
Gas impurity content(ppm) |
C |
≤200 |
≤200 |
≤200 |
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N |
≤100 |
≤100 |
≤100 |
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|
O |
≤600 |
≤600 |
≤600 |
|
|
S |
≤75 |
≤75 |
≤75 |
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Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Cobalt Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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