Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We believe in: Innovation is our soul and spirit. High-quality is our life. Consumer need to have is our God for Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Cancun, Provence, Ecuador, Due to our good goods and services, we've received good reputation and credibility from local and international customers. If you will need more information and are interested in any of our solutions, be sure to feel free to contact us. We look forward to becoming your supplier in the near future.
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