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Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Bear "Customer first, Quality first" in mind, we work closely with our customers and provide them with efficient and professional services for Refractory Alloy , Evaporation Sources , Tio2 Sputtering Target , We warmly welcome clients, enterprise associations and mates from all over the globe to speak to us and find cooperation for mutual rewards.
Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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  • Although we are a small company, we are also respected. Reliable quality, sincere service and good credit, we are honored to be able to work with you!
    5 Stars By Arlene from Sevilla - 2017.11.20 15:58
    Products and services are very good, our leader is very satisfied with this procurement, it is better than we expected,
    5 Stars By Irma from Lyon - 2017.11.11 11:41