Factory Free sample Indium In Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory Free sample Indium In Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Titanium Silicon Sputtering Target Description
A super-hard Nitride coating could be formed when Titanium Silicon combined with Nitrogen gas during deposition process. The Silicon element present ensures high oxidation resistance behavior, whiles Titanium – hardness. It could exhibit excellent wear resistance property even at highly elevated temperatures. Cutting tools deposited by TiSiN coating is ideal for high-speed and hard milling, especially in dry cutting, and could deal with some super alloys, like Nickel and Titanium base alloys.
Our typical TiSi targets and their properties
|
Ti-15Si at% |
Ti-20Si at% |
Ti-25Si at% |
Ti-30Si at% |
|
|
Purity (%) |
99.9 |
99.9 |
99.9 |
99.9 |
|
Density（g/cm3） |
4.4 |
4.35 |
4.3 |
4.25 |
|
Grain Size(µm) |
200/100 |
100 |
100 |
100 |
|
Process |
VAR/HIP |
HIP |
HIP |
HIP |
Our company has many years of experience of manufacturing sputtering targets for mold cutting tools. Ti-15Si at%, fabricated by vacuum melting, has homogeneous structure, high purity and low gas content. Besides, we also supply Ti-15Si at%、Ti-20Si at% and Ti-25Si at% produced by means of power metallurgy. Our TiSi targets have excellent mechanical properties, making them unsusceptible to cracking and structural failure.
Titanium Silicon Sputtering Target Packaging
Our Titanium Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Titanium Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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owing to excellent assistance, a variety of high quality products and solutions, aggressive costs and efficient delivery, we take pleasure in an excellent popularity amongst our customers. We are an energetic business with wide market for Factory Free sample Indium In Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Mumbai, Saudi Arabia, Leicester, We have been very responsible for all details on our customers order no matter on warranty quality, satisfied prices, quick delivery, on time communication, satisfied packing, easy payment terms, best shipment terms, after sales service etc. We provide one-stop service and best reliability to our every customers. We work hard with our customers, colleagues, workers to make a better future.
By Caroline from Palestine - 2017.09.26 12:12
In China, we have many partners, this company is the most satisfying to us, reliable quality and good credit, it is worth appreciation.
By Jack from Luxemburg - 2017.07.07 13:00
