Factory For Ti Sputtering Target - AlSiCu Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

Aluminum Silicon Copper alloy is fabricated by means of vacuum melting and deformation technique. It has high purity, homogeneous microstructure and refined grain size and is used in a number of applications and industries, including PVD coating, vacuum furnace component, X ray sputtering targets. It is also the coating materials for Large Scale Integrated Circuit for its unique combination of desirable characteristics, including light weight , good thermal conductivity, hardness, toughness and corrosion resistance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Silicon Copper Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.