Wholesale Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Sticking for the perception of "Creating goods of high quality and making good friends with people today from all around the world", we constantly set the interest of shoppers to begin with for Igzo Sputtering Target , Mn Sputtering Target , Y Sputtering Target , By more than 8 years of company, now we have accumulated rich experience and advanced technologies from the generation of our merchandise.

Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Our business puts emphasis over the administration, the introduction of talented staff, plus the construction of team building, attempting hard to boost the standard and liability consciousness of personnel customers. Our corporation successfully attained IS9001 Certification and European CE Certification of Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Sri Lanka, Iraq, Holland, Furthermore, all of our items are manufactured with advanced equipment and strict QC procedures in order to ensure high quality. If you are interested in any of our goods, please don't hesitate to contact us. We will do our best to meet your needs.

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