Wholesale Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Adhering to your principle of "quality, assistance, performance and growth", we have now gained trusts and praises from domestic and international customer for Indium In Sputtering Target , Corrosion Resistant Alloy , Tungsten Silicide Wsi2 Sputtering Target , You would not have any communication problem with us. We sincerely welcome prospects all around the globe to call us for business enterprise cooperation.

Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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We pursue the administration tenet of "Quality is remarkable, Services is supreme, Status is first", and will sincerely create and share success with all customers for Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Provence, Comoros, Houston, We are fully aware of our customer's needs. We provide high quality products, competitive prices and the first class service. We would like to establish good business relationships as well as friendship with you in the near future.

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