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Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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Our company promises all users of the first-class products and the most satisfying post-sale service. We warmly welcome our regular and new customers to join us for Boron Sputtering Target , Cobalt Chromium Tungsten Sputtering Target , Tantalum Pellets , Inspired by the rapid developing market of the fast food and beverage consumables all over the world , We are looking forward to working with partners/clients to make success together.
Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of Factory directly supply Molybdenum Disilicide Sputtering Target - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Congo, Colombia, Malaysia, Many years of work experience, we have now realized the importance of providing good quality products and solutions and the best before-sales and after-sales services. Most problems between suppliers and clients are due to poor communication. Culturally, suppliers can be reluctant to question things they do not understand. We break down those barriers to ensure you get what you want to the level you expect, when you want it. faster delivery time and the product you want is our Criterion .
  • The product classification is very detailed that can be very accurate to meet our demand, a professional wholesaler.
    5 Stars By Meredith from Burundi - 2017.06.22 12:49
    This enterprise in the industry is strong and competitive, advancing with the times and develop sustainable, we are very pleased to have a opportunity to cooperate!
    5 Stars By Maud from Florence - 2018.09.29 17:23