Wholesale Factory directly Pb Ingot - Tungsten Silicide – Rich Manufacturer and Supplier

Factory directly Pb Ingot - Tungsten Silicide – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

Gaining purchaser gratification is our company's aim eternally. We're going to make great initiatives to create new and top-quality products, satisfy your exclusive prerequisites and supply you with pre-sale, on-sale and after-sale solutions for Tungsten Silicide Sputtering Target , Iron Fe Sputtering Target , Titanium Aluminum Ti/Al Sputtering Target , Leading the trend of this field is our persistent goal. Providing first class products is our aim. To create a beautiful future, we would like to cooperate with all friends at home and abroad. Should you have any interest in our products, please do not hesitate to contact us.

Factory directly Pb Ingot - Tungsten Silicide – Rich Detail:

Tungsten silicide WSi2 is used as an electric shock material in microelectronics, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm. It is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase its conductivity and increase signal speed. The tungsten Silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to be transformed into a more conductive stoichiometric form.

Tungsten silicide can replace the earlier tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.

Tungsten silicide is also very valuable in microelectromechanical systems, among which tungsten silicide is mainly used as a thin film for manufacturing microcircuits. For this purpose, the tungsten silicide film can be plasma-etched using, for example, silicide.

ITEM	Chemical composition
Element	W	C	P	Fe	S	Si
Content(wt%)	76.22	0.01	0.001	0.12	0.004	Balance

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Tungsten Silicide Sputtering Materials according to Customers’ specifications. For more information, please contact us.

Product detail pictures:

Related Product Guide:

"Sincerity, Innovation, Rigorousness, and Efficiency" is the persistent conception of our firm for the long-term to create jointly with consumers for mutual reciprocity and mutual reward for Factory directly Pb Ingot - Tungsten Silicide – Rich , The product will supply to all over the world, such as: Austria, Norway, Wellington, Now, with the development of internet, and the trend of internationalization, we have decided to extend business to overseas market. With the propose of bringing more profits to oversea customers by providing directly abroad. So we have changed our mind, from home to abroad, hope to give our customers more profit, and looking forward to more chance to make business.

Deposition Methods

Ni/Fe Sputtering Target

Nickel Cobalt Sputtering Target

Ruthenium Ru Sputtering Target

Titanium Ti Sputtering Target

W Sputtering Target

With a positive attitude of "regard the market, regard the custom, regard the science", the company works actively to do research and development. Hope we have a future business relationships and achieving mutual success.