factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Nickel alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide AlNi casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the AlNi coating has good performance under 700℃. Now the AlNi sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Aluminum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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All we do is usually affiliated with our tenet " Buyer to start with, Belief to start with, devoting about the food packaging and environmental defense for factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Afghanistan, Serbia, San Diego, Taking the core concept of "to be the Responsible". We'll redound up on society for high quality merchandise and good service. We will initiative to participate in international competition to be a first- class manufacturer of this product in the world.
By Penny from Hongkong - 2017.04.18 16:45
The factory has advanced equipment, experienced staffs and good management level, so product quality had assurance, this cooperation is very relaxed and happy!
By Sophia from Romania - 2018.08.12 12:27
