factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Nickel alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide AlNi casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the AlNi coating has good performance under 700℃. Now the AlNi sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Aluminum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Our products are widely recognized and trusted by users and can meet continuously developing economic and social needs for factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Hanover, Bogota, France, We warmly welcome you to come to visit us personally. We hope to establish a long-term friendship based on equality and mutual benefit. If you want to get in touch with us, please do not hesitate to call. We will be your best choice.
Good quality and fast delivery, it's very nice. Some products have a little bit problem, but the supplier replaced timely, overall, we are satisfied.










