factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Nickel alloy sputtering target is produced by means of vacuum melting and power metallurgy. Mixing Aluminum and Nickel in an amount necessary to provide AlNi casting ingot. The casting ingot is then cut to form the desired target shape. It has high consistency, refined grain size and homogeneous microstructure, without gas puff or pores.
Owing to its excellent combination of the coating and substrate material, the AlNi coating has good performance under 700℃. Now the AlNi sputtering target is extensively used in wear resistant coatings, including cutting tools, molds, automotive and construction industries.
Rich Special Materials is a Manufacturer of Sputtering Target and could produce Aluminum Nickel Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We have been also concentrating on enhancing the things management and QC method so that we could preserve terrific edge inside the fiercely-competitive enterprise for factory customized Mosi2 Sputtering Target - Nial Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Azerbaijan, Malaysia, Angola, We integrate design, manufacture and export together with more than 100 skillful workers, strict quality controlling system and experienced technology.We keep long term business relationships with wholesaler and distributors form more than 50 countries, such as USA, UK, Canada, Europe and Africa etc.
By Lynn from Malta - 2017.11.01 17:04
The supplier cooperation attitude is very good, encountered various problems, always willing to cooperate with us, to us as the real God.
By Rosalind from Marseille - 2017.09.26 12:12
