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Chinese Professional High Purity Material - CuMn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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We support our purchasers with ideal premium quality products and substantial level company. Becoming the specialist manufacturer in this sector, we've acquired rich practical working experience in producing and managing for Cold Isostatic Pressing , High Entropy Alloys , Ag Sputtering Target , Currently, we are looking forward to even greater cooperation with overseas customers based on mutual benefits. Please feel free to contact us for more details.
Chinese Professional High Purity Material - CuMn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Copper Manganese alloy sputtering target is fabricated by means of vacuum melting. It has homogenous microstructure, high hardness and anti-deformation properties, and long service life. So it could help to reduce manufacturing costs because it is unnecessary to replace the sputter targets at frequent intervals.

Copper Manganese alloy could also be used to produce Manganese brass and Cu-Ni-Mn Alloys. Manganese shows substantial solid solubility in copper and is an effective solid solution strengthening agent. It could noticeably improve the hardness and strength, and corrosion resistance behavior in marine, chloride medium and vapor pressure.

Copper is a chemical element originated from the Old English name coper, which in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Manganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

A wide range of special materials specialising in the manufacture of sputtering targets, we can produce copper and manganese sputtering materials to customer specifications. For more information, please contact us.


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It really is our obligation to satisfy your requirements and efficiently serve you. Your fulfillment is our greatest reward. We're hunting forward to your check out for joint development for Chinese Professional High Purity Material - CuMn Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Austria, Colombia, Florence, All our products are exported to clients in the UK, Germany, France, Spain, the USA, Canada, Iran, Iraq, the Middle East and Africa. Our products are well welcomed by our customers for the high quality, competitive prices and the most favorable styles. We hope to establish business relationship with all customers and bring more beautifu colors for the life.
  • The company has a good reputation in this industry, and finally it tured out that choose them is a good choice.
    5 Stars By Dora from Slovenia - 2018.04.25 16:46
    The customer service staff's attitude is very sincere and the reply is timely and very detailed, this is very helpful for our deal,thank you.
    5 Stars By Eileen from Vietnam - 2017.03.08 14:45