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China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich

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We know that we only thrive if we will guarantee our combined cost competiveness and high-quality advantageous at the same time for Ni Sputtering Target , Non-Ferrous Materials , Samarium Sm Sputtering Target , We are one of the largest 100% manufacturers in China. Many large trading companies import products from us, so we can give you the best price with the same quality if you are interested in us.
China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich detail pictures


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That has a sound small business credit, great after-sales service and modern production facilities, we've earned an outstanding standing amid our buyers across the earth for China wholesale Metal Product - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Egypt, Philippines, luzern, Customer satisfaction is our first goal. Our mission is to pursue the superlative quality, making continual progress. We sincerely welcome you to make progress hand in hand with us, and construct a prosperous future together.
  • The company comply with the contract strict, a very reputable manufacturers, worthy a long-term cooperation.
    5 Stars By Candy from Adelaide - 2018.09.19 18:37
    The factory technical staff gave us a lot of good advice in the cooperation process, this is very good, we are very grateful.
    5 Stars By Yannick Vergoz from Singapore - 2018.06.21 17:11