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China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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All we do is always associated with our tenet " Customer first, Trust first, devoting on the food packaging and environmental protection for Precious Metals , Mn Sputtering Target , Ti Sputtering Target , Safety as a result of innovation is our promise to each other.
China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Vanadium Sputtering Target Description

Vanadium is a hard, ductile metal with a silvery-gray appearance. It is harder than most metals and exhibits good corrosion resistance against alkalis and acids. Its melting point is 1890℃, and boiling point is 3380℃. Its atomic number is 23, and atomic weight is 50.9414. It has a face-centered cubic structure and oxidation states in its compounds of +5, +4, +3 and +2. It has high melting point, ductility, hardness, and corrosion resistance.

Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.

High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.

Chemical Analysis

Purity

99.7

99.9

99.95

99.99

Fe

≤0.1

≤0.05

≤0.02

≤0.01

Al

≤0.2

≤0.05

≤0.03

≤0.01

Si

≤0.15

≤0.1

≤0.05

≤0.01

C

≤0.03

≤0.02

≤0.01

≤0.01

N

≤0.01

≤0.01

≤0.01

≤0.01

O

≤0.05

≤0.05

≤0.05

≤0.03

Impurity in total

≤0.3

≤0.1

≤0.05

≤0.01

Vanadium Sputtering Target Packaging

Our Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.


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China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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To create more value for customers is our business philosophy; customer growing is our working chase for China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Toronto, Bangalore, Portugal, In the new century, we promote our enterprise spirit "United, diligent, high efficiency, innovation", and stick to our policy"basing on quality, be enterprising, striking for first class brand". We would take this golden opportunity to create bright future.
  • Speaking of this cooperation with the Chinese manufacturer, I just want to say"well dodne", we are very satisfied.
    5 Stars By Dominic from Malaysia - 2018.05.22 12:13
    This enterprise in the industry is strong and competitive, advancing with the times and develop sustainable, we are very pleased to have a opportunity to cooperate!
    5 Stars By Rebecca from Ukraine - 2017.11.12 12:31