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China OEM Ti Dioxide Pellets - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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China OEM Ti Dioxide Pellets - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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  • The product manager is a very hot and professional person, we have a pleasant conversation, and finally we reached a consensus agreement.
    5 Stars By Lilith from Hungary - 2018.11.04 10:32
    We have been engaged in this industry for many years, we appreciate the work attitude and production capacity of the company, this is a reputable and professional manufacturer.
    5 Stars By Joanne from Singapore - 2018.10.01 14:14