China Factory for Iron Manganese Femn Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
China Factory for Iron Manganese Femn Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
Product detail pictures:
Related Product Guide:
Being supported by an state-of-the-art and skilled IT team, we could supply technical support on pre-sales & after-sales service for China Factory for Iron Manganese Femn Sputtering Target - CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Haiti, Bulgaria, Canada, We warmly welcome you to come to visit us personally. We hope to establish a long-term friendship based on equality and mutual benefit. If you want to get in touch with us, please do not hesitate to call. We will be your best choice.
A nice supplier in this industry, after a detail and careful discussion, we reached a consensus agreement. Hope that we cooperate smoothly.








