Wholesale Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Featured Image

Short Description:

Product Detail

Product Tags

Feedback (2)

To fulfill the customers' over-expected fulfillment , we have now our solid staff to deliver our greatest general assistance which includes internet marketing, product sales, creating, manufacturing, excellent controlling, packing, warehousing and logistics for Zr Sputtering Target , Titanium Nitride Tin Sputtering Targets , Al/Cr Sputtering Targets , Thanks for taking your worthwhile time to go to us and stay up for have a nice cooperation along with you.

Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Product detail pictures:

Related Product Guide:

As a result of ours specialty and service consciousness, our company has won a good reputation among customers all over the world for Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Egypt, Saudi Arabia, Macedonia, Now the competition in this field is very fierce; but we will still offer best quality, reasonable price and most considerate service in an endeavor to achieve win-win goal. "Change for the better!" is our slogan, which means "A better world is before us, so let's enjoy it!" Change for the better! Are you ready?

Iron Cobalt Tantalum Zirconium Sputtering Target

Metal Evaporation Material

Ni/Fe Sputtering Target

Nickel Tungsten Niw Sputtering Target

Reactive Sputtering

Silicon Ingot

As a veteran of this industry, we can say that the company can be a leader in the industry, select them is right.

By Maud from Bolivia - 2017.01.28 19:59

We have been cooperated with this company for many years, the company always ensure timely delivery ,good quality and correct number, we are good partners.

By Fay from Bangkok - 2018.09.23 18:44