Wholesale Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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"Control the standard by the details, show the power by quality". Our organization has strived to establish a highly efficient and stable employees team and explored an effective high-quality command method for Iron Cobalt Tantalum Zirconium Fecotazr Sputtering Target , Tantalum Ta Sputtering Target , Rare Earth Metal , Base within the small business concept of Top quality initially, we want to fulfill more and additional friends within the word and we hope provide the ideal solution and services to you.

Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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We constantly continually give you essentially the most conscientious client provider, plus the widest variety of designs and styles with finest materials. These initiatives include the availability of customized designs with speed and dispatch for Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Cyprus, Sri Lanka, Colombia, Regarding quality as survival, prestige as guarantee, innovation as motive force, development along with advanced technology, our group hopes to make progress together with you and make untiring efforts for the bright future of this industry.

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Although we are a small company, we are also respected. Reliable quality, sincere service and good credit, we are honored to be able to work with you!