Wholesale Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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carry on to further improve, to guarantee merchandise high-quality in line with market and buyer standard necessities. Our organization has a top quality assurance procedure have already been established for Nickel Tungsten Niw Sputtering Target , Cobalt Tantalum Zirconium Cotazr Sputtering Target , Ag Wire , We stick to providing integration solutions for customers and hope to build long-term, stable, sincere and mutual beneficial relationships with customers. We sincerely look forward to your visit.

Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1. Powder grinding and mixing.

2. Hot isostatic pressing treatment to get semi-finished products.

3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi，CrAlTi，CrAlZr, CrAlTa，CrAlW，CrAlY，CrAlCe，etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Our pursuit and enterprise aim would be to "Always fulfill our buyer requirements". We carry on to acquire and layout excellent quality items for the two our old and new clients and realize a win-win prospect for our shoppers in addition as us for Big discounting Rf Magnetron Sputtering - Cral Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Mauritius, Moldova, Las Vegas, Profession, Devoting are always fundamental to our mission. We have always been in line with serving customers, creating value management objectives and adhering to the sincerity, dedication, persistent management idea.

Iron Cobalt Tantalum Zirconium Sputtering Target