Wholesale Best Price for High Temperature Alloy - Alta Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Manufacturer and Supplier

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Generally customer-oriented, and it's our ultimate goal for being not only the most trusted, trustable and honest provider, but also the partner for our customers for Thin Film Materials , Mo Sputtering Target , Al2o3 Sputtering , Now we have established steady and long business relationships with customers from North America, Western Europe, Africa, South America, more than 60 countries and regions.

Best Price for High Temperature Alloy - Alta Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:

The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.

Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.

Impurity content of Al-Ta alloy

composition	Content（%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Aluminum-Chromium Al/Cr Sputtering Targets