2021 New Style Magnesium Sputtering Target - High purity CuIn Target Factory price Copper Indium alloy target magnetron sputtering target – Rich

High purity CuIn Target Factory price Copper Indium alloy target magnetron sputtering target,
copper alloy target CuIn Target Copper Indium alloy target,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.The target of copper indium alloy is the target of high purity copper and indium smelting. Except for beryllium and several refractory metals, indium can almost form different types of alloy with all elements in the periodic table. Copper indium alloy is a binary alloy, its melting temperature is relatively low, mainly used as some low melting point alloy or solder.
The biggest advantage of copper-indium alloy sputtering target is to obtain films with excellent conductivity and minimum particle size during physical vapor deposition. CIGS thin film made from this target is a direct bandgap compound semiconductor material composed of copper, indium, selenium and other metal elements. Its absorption coefficient of visible light is the highest among all thin film battery materials, but the consumption of raw materials is far lower than that of traditional crystalline silicon solar cells.