2021 New Style Deposition Methods - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
2021 New Style Deposition Methods - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.
Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.
Product detail pictures:
Related Product Guide:
We're also concentrating on improving the things administration and QC program to ensure we could maintain terrific gain from the fiercely-competitive company for 2021 New Style Deposition Methods - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Algeria, Luxemburg, Greece, To make every client satisfied with us and achieve win-win success, we will continue to try our best to serve and satisfy you! Sincerely looking forward to cooperating with more overseas customers based on mutual benefits and great future business. Thank you.
Managers are visionary, they have the idea of "mutual benefits, continuous improvement and innovation", we have a pleasant conversation and Cooperation.










