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100% Original Glass Sealing Alloy - CrAlSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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By using a full scientific excellent administration method, great quality and fantastic religion, we get good reputation and occupied this discipline for Nickel Iron Ni/Fe Sputtering Target , Dc Magnetron Sputtering , Copper Nickel Titanium Cuniti Alloy Sputtering Target , With the development of society and economy, our company will keep a tenet of "Focus on trust, quality the first", moreover, we expect to create a glorious future with every customer.
100% Original Glass Sealing Alloy - CrAlSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.


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100% Original Glass Sealing Alloy - CrAlSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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Our enterprise insists all along the standard policy of "product high-quality is base of business survival; client satisfaction could be the staring point and ending of an business; persistent improvement is eternal pursuit of staff" as well as consistent purpose of "reputation first, client first" for 100% Original Glass Sealing Alloy - CrAlSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Muscat, Lithuania, Anguilla, In order to meet more market demands and long-term development, a 150, 000-square-meter new factory is under construction, which will be put into use in 2014. Then, we shall own a large capacity of producing. Of course, we will continue improving the service system to meet the requirements of customers, bringing health, happiness and beauty to everyone.
  • The accounts manager made a detailed introduction about the product, so that we have a comprehensive understanding of the product, and ultimately we decided to cooperate.
    5 Stars By Lauren from Belgium - 2018.06.30 17:29
    This company conforms to the market requirement and joins in the market competition by its high quality product, this is an enterprise that have Chinese spirit.
    5 Stars By Sabrina from Israel - 2018.06.21 17:11