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  • Zinc-Manganese Sputtering Targets: Key Material Innovation and Application Breakthroughs

    Zinc-Manganese Sputtering Targets: Key Material Innovation and Application Breakthroughs

    The Material Challenges Behind Sputtering Technology Advancements As semiconductor manufacturing enters the 3nm process era, traditional copper-nickel targets reveal growing limitations. A 2023 Global Market Insights report shows the global sputtering target market has reached 6.5billion,yetthesu...
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  • Exploring Constantan Alloy Targets: From Challenges to Practical Solutions

    Exploring Constantan Alloy Targets: From Challenges to Practical Solutions

    Constantan (CuNi44), a copper-nickel alloy,constantan – resistance alloy sputtering target is critical in thin-film deposition for electronics. Its near-zero thermal coefficient of resistance makes it ideal for precision resistors. However, sourcing high-purity Constantan targets remains a ...
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  • High-Performance Copper Alloy Sputtering Targets

    High-Performance Copper Alloy Sputtering Targets

    In today’s information age, semiconductor chips act as the “brains” of modern society, powering the operation of various electronic devices. Yet, in the intricate and complex process of chip manufacturing, a seemingly inconspicuous material plays a critical role—high-performance...
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  • High purity Nickel (Ni) and Nickel alloy target for pvd coating

    High purity Nickel (Ni) and Nickel alloy target for pvd coating

    In the field of modern materials science and technology, nickel and nickel alloy targets, as high-purity materials used in thin film preparation processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), are playing a pivotal role. Through methods like sputtering or e...
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  • Chromium (Cr) Target and Chromium alloy target

    Chromium (Cr) Target and Chromium alloy target

    In the era of booming high-tech industries, chromium targets are playing an increasingly vital role as a key precision manufacturing material. From smartphones to tablets, and from solar cells to semiconductor chips, chromium targets are ubiquitous, quietly driving technological advancements and ...
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  • Nilo alloy 42 Expansion alloy  (FeNi42) Alloy Material Precision alloy material

    Nilo alloy 42 Expansion alloy (FeNi42) Alloy Material Precision alloy material

    Nilo alloy 42  is a high-performance iron-nickel-based precision alloy, also known as Invar 42.FeNi42, 4J42, Its main components include iron (Fe) and nickel (Ni). The nickel content is approximately 41.5% to 42.5%, with the remaining being iron.  The preparation process of Nilo alloy 42  alloy ...
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  • Nickel Iron Vanadium (NiFeV) alloy target

    Nickel Iron Vanadium (NiFeV) alloy target

    Nickel-Iron-Vanadium alloy target is an important Magnetron sputtering coating material. NiFeV alloy target is mainly composed of nickel, iron, and vanadium elements in a certain proportion and prepared through special processes. The target features with high purity, good mechanical propertie...
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  • High Purity Aluminum (Al) Target

    High Purity Aluminum (Al) Target

    High-purity aluminum targets are materials made of high-purity aluminum metal materials as the main component for sputtering coating and other processes,it is a functional film target materials The sputtering target usually referring to aluminum targets with purity of 99.99% (4N) and above, and u...
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  • Zinc copper (ZnCu)alloy target

    Zinc copper (ZnCu)alloy target

    Zinc-copper alloy target is a sputtering coating material that plays an important role in the fields of material surface treatment and thin film preparation. It mainly consists of zinc (Zn) and copper (Cu). By precisely controlling the ratio of the two, zinc-copper alloy targets with different pr...
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  • Sponge titanium high purtiy raw materials

    Sponge titanium high purtiy raw materials

    Sponge titanium  is a metallic titanium in the shape of sponge, which is obtained by chlorinating rutile ore  to generate titanium tetrachloride and then reducing it with active elements such as magnesium or sodium. It is commonly known as sponge titanium. Sponge titanium American Standard (ASTM ...
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  • Aluminum silicon(AlSi) alloy target

    Aluminum silicon(AlSi) alloy target

    Aluminum-silicon alloy target is an alloy material with aluminum and silicon as the main components, and the content ratio can be adjusted according to different application requirements. Aluminum-silicon sputtering target has good thermal conductivity, corrosion resistance, moderate strength and...
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  • ASTM A182 F22 Chrome Moly Alloy materials

    ASTM A182 F22 Chrome Moly Alloy materials

    F22 is a commonly used alloy steel in the industrial field. It is also known as UNS K21590, 2¼Cr – 1Mo steel, SA182 F22, Chrome Moly F22, Alloy F22, etc.F22 materials contains elements such as iron, chromium and molybdenum, and has good strength standards and specifications. It is made thro...
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