The Material Challenges Behind Sputtering Technology Advancements
As semiconductor manufacturing enters the 3nm process era, traditional copper-nickel targets reveal growing limitations. A 2023 Global Market Insights report shows the global sputtering target market has reached
6.5billion,yetthesu...
Constantan (CuNi44), a copper-nickel alloy,constantan – resistance alloy sputtering target is critical in thin-film deposition for electronics. Its near-zero thermal coefficient of resistance makes it ideal for precision resistors. However, sourcing high-purity Constantan targets remains a ...
In today’s information age, semiconductor chips act as the “brains” of modern society, powering the operation of various electronic devices. Yet, in the intricate and complex process of chip manufacturing, a seemingly inconspicuous material plays a critical role—high-performance...
In the field of modern materials science and technology, nickel and nickel alloy targets, as high-purity materials used in thin film preparation processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), are playing a pivotal role. Through methods like sputtering or e...
In the era of booming high-tech industries, chromium targets are playing an increasingly vital role as a key precision manufacturing material. From smartphones to tablets, and from solar cells to semiconductor chips, chromium targets are ubiquitous, quietly driving technological advancements and ...
Nilo alloy 42 is a high-performance iron-nickel-based precision alloy, also known as Invar 42.FeNi42, 4J42, Its main components include iron (Fe) and nickel (Ni). The nickel content is approximately 41.5% to 42.5%, with the remaining being iron.
The preparation process of Nilo alloy 42 alloy ...
Nickel-Iron-Vanadium alloy target is an important Magnetron sputtering coating material. NiFeV alloy target is mainly composed of nickel, iron, and vanadium elements in a certain proportion and prepared through special processes. The target features with high purity, good mechanical propertie...
High-purity aluminum targets are materials made of high-purity aluminum metal materials as the main component for sputtering coating and other processes,it is a functional film target materials The sputtering target usually referring to aluminum targets with purity of 99.99% (4N) and above, and u...
Zinc-copper alloy target is a sputtering coating material that plays an important role in the fields of material surface treatment and thin film preparation. It mainly consists of zinc (Zn) and copper (Cu). By precisely controlling the ratio of the two, zinc-copper alloy targets with different pr...
Sponge titanium is a metallic titanium in the shape of sponge, which is obtained by chlorinating rutile ore to generate titanium tetrachloride and then reducing it with active elements such as magnesium or sodium. It is commonly known as sponge titanium.
Sponge titanium American Standard (ASTM ...
Aluminum-silicon alloy target is an alloy material with aluminum and silicon as the main components, and the content ratio can be adjusted according to different application requirements. Aluminum-silicon sputtering target has good thermal conductivity, corrosion resistance, moderate strength and...
F22 is a commonly used alloy steel in the industrial field. It is also known as UNS K21590, 2¼Cr – 1Mo steel, SA182 F22, Chrome Moly F22, Alloy F22, etc.F22 materials contains elements such as iron, chromium and molybdenum, and has good strength standards and specifications. It is made thro...