Iron-nickel alloys are a family of precision alloys primarily composed of iron and nickel (with nickel content typically ranging from 30% to 90%), whose properties are fine-tuned by adding small amounts of other elements (such as molybdenum, copper, chromium, etc.). They are not ordinary steels b...
Stainless steel is all around us, from kitchen sinks and utensils to the curtain walls of skyscrapers. While it may seem ordinary, it is actually a great invention in the history of human materials.
Why is Stainless Steel “Stainless”?
Its secret lies in the addition of a key element—c...
In the semiconductor industry and electronic thin film preparation, the performance of sputtering targets directly determines the quality of deposited films, and the backing plate bonding technology behind the target is an indispensable key link in this process.
During physical vapor deposition (...
Sputtering targets are the core materials in physical vapor deposition (PVD) technology. Through ion bombardment, target atoms are deposited onto substrates to form functional thin films. Among them, aluminum chromium alloy sputtering targets play an indispensable role in semiconductors, display ...
In the pursuit of green energy and cutting-edge electronic technology, there is a fundamental material that, while inconspicuous, is crucial: the sputtering target. Imagine this: inside a high-vacuum chamber, a solid material is bombarded by high-energy particles, causing its atoms to fly off lik...
Manganese Copper M2052 Damping alloy is a specialized high-damping functional material used for vibration and noise reduction. It is not an ordinary support gasket, but rather a structural-functional integrated component that effectively converts mechanical vibration energy into thermal energy. T...
Today, with the rapid development of semiconductor and display technologies, sputtering targets, as the core materials in thin film deposition processes, directly determine the quality of the final product. Among them, the iron-copper alloy sputtering target, with its unique performance advantage...
Manganese-Cobalt Alloy Target is an advanced functional material synthesized from cobalt and manganese in specific proportions, used to form functional thin films on substrates through physical vapor deposition technology. It perfectly combines cobalt’s high magnetic properties and excellen...
As the performance requirements for mechanical components in modern industry continuously increase, traditional coating materials are increasingly revealing their limitations. The chromium diboride sputtering target, as an emerging advanced coating material, is becoming a key solution to material...
What Are Nickel-Cobalt Alloy Sputtering Targets, and Why Are They So Important?
Nickel-cobalt alloy sputtering targets are critical materials used in physical vapor deposition (PVD) processes, primarily composed of nickel and cobalt in specific ratios. These materials play an indispensable role ...
In today’s rapidly advancing fields of advanced manufacturing and materials science, sputtering targets, as core materials for surface engineering and thin-film preparation, are playing an increasingly vital role.
Among them, nickel-cobalt-iron-aluminum-chromium-titanium (Ni-Co...
An iron-nickel-chromium sputtering target (Fe-Ni-Cr Sputtering Target) is a high-purity alloy material used in physical vapor deposition (PVD), composed of iron (Fe), nickel (Ni), and chromium (Cr) in specific ratios.
For example, in the semiconductor industry, iron-nickel-chromium sputtering tar...