Welcome to our websites!

News

  • HEA Iron Titanium Copper Chromium Manganese alloy targets

    HEA Iron Titanium Copper Chromium Manganese alloy targets

    In the fields of advanced manufacturing and new material R&D, the demand for high-performance thin films is rapidly growing. Traditional single-metal targets, such as pure copper or chromium targets, are struggling to meet increasingly complex application scenarios. At this point, an innovati...
    Read more
  • Introduction to Copper-Nickel Alloy Bars

    Introduction to Copper-Nickel Alloy Bars

    Here is a comprehensive introduction to copper-nickel alloy bars, covering their definition, common grades, core properties, main applications, and advantages. 1. What are Copper-Nickel Alloy Bars? Copper-nickel alloy bars, commonly known as ”cupronickel bars,” are wrought products (b...
    Read more
  • Introduction to Iron-Nickel Alloys

    Introduction to Iron-Nickel Alloys

    Iron-nickel alloys are a family of precision alloys primarily composed of iron and nickel (with nickel content typically ranging from 30% to 90%), whose properties are fine-tuned by adding small amounts of other elements (such as molybdenum, copper, chromium, etc.). They are not ordinary steels b...
    Read more
  • Stainless Steel: The Miracle of Not Rusting

    Stainless Steel: The Miracle of Not Rusting

    Stainless steel is all around us, from kitchen sinks and utensils to the curtain walls of skyscrapers. While it may seem ordinary, it is actually a great invention in the history of human materials. Why is Stainless Steel “Stainless”? Its secret lies in the addition of a key element—c...
    Read more
  • Sputtering Target Bonding with Backplate

    Sputtering Target Bonding with Backplate

    In the semiconductor industry and electronic thin film preparation, the performance of sputtering targets directly determines the quality of deposited films, and the backing plate bonding technology behind the target is an indispensable key link in this process. During physical vapor deposition (...
    Read more
  • Aluminum Chromium (AlCr) Sputtering Targets

    Aluminum Chromium (AlCr) Sputtering Targets

    Sputtering targets are the core materials in physical vapor deposition (PVD) technology. Through ion bombardment, target atoms are deposited onto substrates to form functional thin films. Among them, aluminum chromium alloy sputtering targets play an indispensable role in semiconductors, display ...
    Read more
  • Copper Zinc Tin Alloy Sputtering Target

    Copper Zinc Tin Alloy Sputtering Target

    In the pursuit of green energy and cutting-edge electronic technology, there is a fundamental material that, while inconspicuous, is crucial: the sputtering target. Imagine this: inside a high-vacuum chamber, a solid material is bombarded by high-energy particles, causing its atoms to fly off lik...
    Read more
  • Manganese Copper M2052 Damping Alloy Gasket

    Manganese Copper M2052 Damping Alloy Gasket

    Manganese Copper M2052 Damping alloy is a specialized high-damping functional material used for vibration and noise reduction. It is not an ordinary support gasket, but rather a structural-functional integrated component that effectively converts mechanical vibration energy into thermal energy. T...
    Read more
  • Iron-Copper Alloy Sputtering Target

    Iron-Copper Alloy Sputtering Target

    Today, with the rapid development of semiconductor and display technologies, sputtering targets, as the core materials in thin film deposition processes, directly determine the quality of the final product. Among them, the iron-copper alloy sputtering target, with its unique performance advantage...
    Read more
  • Manganese-Cobalt Alloy Target

    Manganese-Cobalt Alloy Target

    Manganese-Cobalt Alloy Target is an advanced functional material synthesized from cobalt and manganese in specific proportions, used to form functional thin films on substrates through physical vapor deposition technology. It perfectly combines cobalt’s high magnetic properties and excellen...
    Read more
  • Chromium Diboride Sputtering Target

    Chromium Diboride Sputtering Target

    As the performance requirements for mechanical components in modern industry continuously increase, traditional coating materials are increasingly revealing their limitations. The chromium diboride sputtering target, as an emerging advanced coating material, is becoming a key solution to material...
    Read more
  • A Comprehensive Analysis of Nickel-Cobalt Alloy Sputtering Targets

    A Comprehensive Analysis of Nickel-Cobalt Alloy Sputtering Targets

    What Are Nickel-Cobalt Alloy Sputtering Targets, and Why Are They So Important? Nickel-cobalt alloy sputtering targets are critical materials used in physical vapor deposition (PVD) processes, primarily composed of nickel and cobalt in specific ratios. These materials play an indispensable role ...
    Read more
123456 Next > >> Page 1 / 24