F22 is a commonly used alloy steel in the industrial field. It is also known as UNS K21590, 2¼Cr – 1Mo steel, SA182 F22, Chrome Moly F22, Alloy F22, etc.F22 materials contains elements such as iron, chromium and molybdenum, and has good strength standards and specifications. It is made thro...
Molybdenum sputtering target is a material used in Physical Vapor Deposition (PVD) technology. During the sputtering process, high-energy particles (such as argon ions) bombard the surface of the molybdenum target, causing molybdenum atoms to be sputtered out and deposited on the substrate materi...
Expansion alloy is a kind of alloy with special thermal expansion properties. In a certain temperature range, Dilatant alloy materials coefficient of thermal expansion (CTE) either remains extremely low (low expansion alloys), or can match the coefficient of thermal expansion of other materials (...
Nickel-iron-molybdenum alloy target is a kind of alloy target composed of nickel (Ni), iron (Fe), molybdenum (Mo) three metal elements in accordance with a certain proportion, mainly used in thin film deposition technology, by sputtering and other methods in variousmatrix materials to prepare nic...
Elastic alloy is a kind of alloy material with special elastic properties. When subjected to external forces, it can produce large elastic deformations and quickly return to its original state after the removal of the external forces. The amount of deformation has a linear relationship with the a...
Aluminum-tin-copper alloy target is a multicomponent alloy made of aluminum, tin and copper fused in a specific ratio. AlSnCu thin film coating target has the advantages of all three elements, moderate hardness, good wear resistance, and good corrosion resistance. Aluminum Tin copper sputtering t...
Titanium is a chemical element with an atomic number of 22 that is classified as a transition metal on the periodic table. Titanium alloy is an alloy composed of titanium (Ti) as a base and other elements. In titanium alloys, in addition to titanium itself, other alloying elements such as aluminu...
Molybdenum disilicide (MoSi2) is a kind of inorganic compound, which has the dual characteristics of metal and ceramic, and is a high temperature material with excellent performance. MoSi2 target is Metallic gray, tetragonal crystal structure with metallic luster. SiMo2 materials with high-meltin...
Sputtering targets can be divided into metal targets, alloy targets, and ceramic targets according to the material. today,Today, i will take you to understand the metal target.
Metal targets are vital materials in modern industry and are widely used in many fields. Metal target is usually used a...
There are various methods for preparing thin films. There are mainly physical vapor deposition (PVD) chemical vapor deposition (CVD), and sol-gel method and electroplating method in chemical solution coating are also more common.Next, we mainly talk about pvd coating and cvd coating.
PVD (Physica...
Chromium-tungsten alloy pvd target is made of chromium and tungsten two kinds of metal alloy material, with high temperature strength, corrosion resistance, high hardness characteristics, widely used in machining, aerospace and other fields.
Chromium-tungsten alloy thin film coating materials ...
CoMn alloy target is a kind of material used in magnetron sputtering technology, mainly used for the preparation of thin films material and coatings. Its composition mainly includes cobalt (Co) and manganese (Mn), and the specific composition ratio can be adjusted according to demand. This all...