As we all know, the methods commonly used in vacuum coating are vacuum transpiration and ion sputtering. What is the difference between transpiration coating and sputtering coating Many people have such questions. Let’s share with you the difference between transpiration coating and sputter...
Sputtering targets are mainly used in electronic and information industries, such as integrated circuit, information storage, LCD, laser memory, electronic controller, etc. they are also used in the field of glass coating, wear-resistant materials, high temperature corrosion resistance, high-grad...
At present, almost all the high-end ultra-high purity metal copper targets required by the IC industry are monopolized by several large foreign multinational companies. All the ultrapure copper targets needed by the domestic IC industry need to be imported, which is not only expensive, but also c...
Refractory tungsten metals and tungsten alloys have the advantages of high temperature stability, high resistance to electron migration and high electron emission coefficient. High-purity tungsten and tungsten alloy targets are mainly used to fabricate gate electrodes, connection wiring, diffusio...
The thin film on the coated target is a special material shape. In the specific direction of thickness, the scale is very small, which is a microscopic measurable quantity. In addition, because of the appearance and interface of film thickness, material continuity terminates, which makes the ...
With the development of electronic industry, the transition from high-tech information to thin films is gradual, and the coating period is carried out rapidly. Ceramic target, as the basis for the development of nonmetallic film industry, has achieved unprecedented development and the market ...
Modern buildings began to use large areas of glass lighting. This aspect gives us brighter rooms and wider horizons. On the other hand, the heat transmitted through the glass is much higher than the surrounding walls, and the energy consumption of the whole building increases significantly.
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Metal target refers to the intended material of high-speed energy-carrying particles that are impacted. In addition, by replacing different target materials (eg, aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (eg, superhard, wear-resistant, anti-corrosi...
Sputtering titanium alloy target and titanium metal are composed of titanium, so the information is roughly the same, but the difference between the two mainly lies in the sputtering titanium alloy target is made of titanium metal through several ways, and titanium occurs in nature as a titan...
With the development of industrial technology, the quality of targets required for industrial production is also getting higher and higher, because the quality of targets directly affects the performance of magnetron sputtering films.Nowadays, enterprises generally prefer to use high-density t...
We all know that there are many specifications of sputtering target, which has a wide range of application.The target varieties commonly used in different industries are also different, today let’s come with Beijing Richmat together to learn about the sputtering target industry classificati...
Thin-film transistor LCD panels are currently the mainstream planar display technology, and metal sputtering targets are one of the most critical materials in the manufacturing process.At present, the metal sputtering targets used in the domestic mainstream LCD panel production line has the great...