With the development of electronic information industry, high-tech materials are gradually transferred from sheet to thin film, and coating devices develop rapidly. Target material is a special electronic material with high added value, and it is the source of sputtering thin film materials. As the basic material for the development of nonmetallic film industry, ceramic target material has been developed unprecedented and the market scale of target material is expanding day by day.
There are two types of ceramic targets:
(1) According to chemical composition, it can be divided into oxide ceramic target, silicide ceramic target, nitride ceramic target, fluoride ceramic target and sulfide ceramic target, etc. The planar display ITO ceramic target has been widely produced and applied in China. Ceramic targets for high dielectric insulation films and giant magnetoresistance ceramic targets have broad application prospects.
(2) According to the application, it can be divided into semiconductor associated ceramic target, display ceramic target, magnetic recording ceramic target, optical recording ceramic target, superconducting ceramic target, giant magnetoresistance ceramic target, etc.
Ceramic target in the existing complex electronic product manufacturing, only accounts for a small part of the engineering, but has played the role of information industry basic pilot material. Domestic ceramic plane target mainly choose sintering and binding process, can produce the maximum length of 600mm, the maximum width of 400mmm, the maximum thickness of 30mm, fillet, bevel, steps and other special-shaped processing according to customer requirements. With the rapid development of China’s electronic information industry, the demand for ceramic sputtering target is increasing year by year. In the future, the research and development of ceramic sputtering target is an important topic for China’s target suppliers.
Post time: Jul-22-2022