Welcome to our websites!

Application field of molybdenum sputtering target material

  Molybdenum is a metallic element, mainly used in the iron and steel industry, most of which is directly used in steel making or cast iron after industrial molybdenum oxide is pressed, and a small part of it is melted into ferro molybdenum and then used in steel making. It can enhance the alloy’s strength, hardness, weldability and toughness, but also enhance its high temperature strength and corrosion resistance. So what fields are molybdenum sputtering targets used in? The following is the share from editor of RSM.

https://www.rsmtarget.com/

  Application of molybdenum sputtering target material

  In the electronic industry, molybdenum sputtering target is mainly used in flat display, thin film solar cell electrode and wiring material and semiconductor barrier material. These are based on molybdenum’s high melting point, high electrical conductivity, low specific impedance, better corrosion resistance, and good environmental performance.

  Molybdenum is one of the preferred materials for sputtering target of flat display because of its advantages of only 1/2 of impedance and film stress compared with chromium and no environmental pollution. In addition, the use of molybdenum in LCD components can greatly improve the performance of LCD in brightness, contrast, color and life.

  In the flat panel display industry, one of the main market applications of molybdenum sputtering target is TFT-LCD. Market research indicates that the next few years will be the peak of LCD development, with an annual growth rate of about 30%. With the development of LCD, the consumption of LCD sputtering target also increases rapidly, with an annual growth rate of about 20%. In 2006, the global demand for molybdenum sputtering target material was about 700T, and in 2007, it was about 900T.

  In addition to flat panel display industry, with the development of new energy industry, the application of molybdenum sputtering target in thin film solar photovoltaic cells is increasing. CIGS(Cu indium Gallium Selenium) thin film battery electrode layer is formed on molybdenum sputtering target by sputtering.


Post time: Jul-16-2022